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Řešení | Povlakový materiál | Technologie povlakování | Tvrdost povlaku HIT [GPa] | Součinitel tření (za sucha) vs. ocel | Max. provozní teplota [°C] | Teplota procesu [°C] | |
---|---|---|---|---|---|---|---|
MoN | Sputter / Arc | 15 – 35 v závislosti od aplikace | - | 800 | - | ||
ta-C | Arc | > 40 | 0,1 - 0,2 | 450 | - | ||
TiN | Arc | 30 +/- 3 | ~ 0,6 | 600 | < 350 | ||
AlTiN | Arc | 30 +/- 3 | ~ 0.6 | 900 | < 350 | ||
AlTiN | Arc | ≥ 20 | 0.4 - 0.5 | - | 250 - 300 | ||
TiN:Ag | Arc | 25 - 29 | ~ 0.5 | - | < 350 | ||
a-C:H:W (WC/C) | Sputter | 8-12 / 12-15 | 0,1 - 0,2 | 300 | < 250 | ||
CrN | Sputter | 18 +/- 3 | ~0.5 | 700 | < 250 | ||
a-C:H | PACVD | ~ 15 - 25 | 0,1 - 0,2 | 300 | < 250 | ||
CrN + a-C:H | PACVD | ~ 15 - 25 | 0.1 - 0.2 | 300 | < 250 | ||
TiAlN | Arc | 33 +/- 3 | 0,6 | 700 | < 350 | ||
TiCN | S3p | ≥ 35 | ~ 0.6 | - | < 400 | ||
ZrN (Zirconium Nitride) | Arc | 20 - 25 | 0.5 | 500 | 350 | ||
TiN | Arc | 30 +/- 3 | ~0,6 | 600 | < 500 |
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|
a-C:H:Me (WC/C) | Sputter | 10 - 15 | 0,1 - 0,2 | 300 | < 250 | ||
CrN + a-C:H:Me (WC/C) | Sputter | 8-12 / 12-15 | 0,1 - 0,2 | 300 | < 250 | ||
TiN + a-C:H | PACVD | ~25-35 | 0,1 - 0,2 | 350 | 250 - 350 | ||
CrN | Sputter | 18 +/-3 | ~0,5 | 700 | < 250 | ||
CrN | Arc | 25+/-3 | ~0,5 | 700 | 500 | ||
CrN | Arc | 18+/-3 | ~0,5 | 700 | - |
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|
a-C:H | PACVD | ~15-25 | 0,1 - 0,2 | 300 | < 250 | ||
CrN / a-C:H | PACVD | ~15-25 | 0,1 - 0,2 | 300 | < 250 | ||
a-C:H:Si | PACVD | ~ 15-25 | 0.05 - 0.2 | 350 | < 220 | ||
TiAlN | Arc | 33 +/- 3 | ~0.6 | 900 | 500 |
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|
ta-C | Filtered Arc | 35-50 | 0.1 - 0.2 | 450 | < 100 | ||
TiAlN | Arc | 32 +/- 2 | ~0.6 | 700 | < 500 | ||
a-C | S3p | 30–40 | 0.1 - 0.2 | 350 | < 200 | ||
CrN / a-C | S3p | 30–40 | 0.1 - 0.2 | 350 | < 200 |
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- | - | - | - | - | - | ||
- | - | - | - | - | - | ||
- | - | - | - | - | - | ||
NiCrAlY (Ni, Ni/Co, Co) | Arc | 7 - 11 | - | 1200 | 400 - 500 |
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- | - | - | - | - | - |
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